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Vacuum unit pumping gas containing particles

Vacuum unit is used to pump air and other non condensable and non corrosive gases. It is widely used in various vacuum systems which need high pumping speed and low and high vacuum. It is also the first choice for coarse and medium vacuum systems. For example: vacuum smelting, liquid steel degassing, vacuum sintering, dynamic vacuum acquisition in large-scale space simulation experiment, vacuum impregnation treatment of power capacitor and transformer, exhaust of automatic production line of fluorescent tube and bulb, continuous exhaust of heat preservation bottle, pre extraction of vacuum coating equipment, extraction of magnesium reduction process, degassing of monocrystalline silicon refining process, etc.

If the pumped gas contains solid particles, part of the particles will be discharged from the pump with the gas, and the other part of the particles will continue to rub in the gap in the pump, causing the gap to increase, resulting in the increase of leakage and the decrease of vacuum and gas volume. Therefore, roots vacuum unit is not suitable for pumping gas containing a large number of solid particles, especially solid particles with larger particle size and higher hardness.

The solution to the problem that the gas containing particles must be pumped: if unavoidable, the gas can be purified before entering roots vacuum unit (such as setting filter screen or adding vacuum buffer tank, etc.). If purification is difficult, the particles in the unit should be washed clean after pumping.

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